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Securities Litigation Reform Act

PRESS RELEASE: ASML, FOM/NWO and UvA/VU plan to establish Institute for Nanolithography

Media Relations and Investor Relations contacts at the end of the press release VELDHOVEN and AMSTERDAM, the Netherlands, 27 May 2013 - ASML, the Foundation for Fundamental Research on Matter (FOM), the University of Amsterdam (UvA), the VU University Amsterdam and the Netherlands Organisation for Scientific Research (NWO) announce their intention to establish the Institute for Nanolithography (INL), which will conduct fundamental and applied research in areas that are key to unlocking innovation in the global semiconductor industry. The initial research program of the INL will focus on physical and chemical processes that are key for future extensions of Extreme Ultraviolet (EUV) lithography. This technology is at the forefront of chip manufacturing and is indispensable for innovation in the global semiconductor industry. The institute is expected to make important contributions to semiconductor lithography, which is the key manufacturing technology for making the memory chips and pro...

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